skip to primary navigationskip to content
 

MOCVD Reactors

Metal-organic chemical vapour deposition (MOCVD) is a versatile technique for high quality epitaxial layer growth. It also has the advantage of being scalable for growth on large area substrates, and hence is widely used in the semiconductor industry. At the Cambridge Centre for Gallium Nitride our research projects are split between three MOCVD reactors.